| 000 | 00422nam a2200109Ia 4500 | ||
|---|---|---|---|
| 008 | 230817s9999 xx 000 0 und d | ||
| 100 | _aMarkus Tautz et al | ||
| 245 | 0 | _aInfluence of the Epitaxial Composition on N-face GaN KOH Etch Kinetics Determined by ICP-OES | |
| 650 | _aComputer science, information & general works | ||
| 856 | _uhttps://new.zodml.org/sites/default/files/2023-08/influe1%20%287%29.pdf | ||
| 942 | _cEBK | ||
| 999 |
_c39216 _d39216 |
||